Assume the capacitor areas of top and tunnel oxide are identical, which of the following statements is NOT true about designing oxide thickness?
A: The minimum of top oxide thickness is limited by erase speed.
B: The minimum of tunnel oxide thickness is limited by charge retention time.
C: The maximum of top oxide thickness is limited by coupling ratio.
D: The maximum of tunnel oxide thickness is limited by program speed.
A: The minimum of top oxide thickness is limited by erase speed.
B: The minimum of tunnel oxide thickness is limited by charge retention time.
C: The maximum of top oxide thickness is limited by coupling ratio.
D: The maximum of tunnel oxide thickness is limited by program speed.
举一反三
- What is NOT true about the thermal oxide layer? A: A thermal oxide layer can serve as a passivation layer. B: A thermal oxide layer acts as an insulator and forces the electrons to flow in the emitter. C: It creates a back surface field at the back side of the solar cell and thus it reduces the surface recombination velocity. D: The oxide layer can be thermally grown.
- About the oxide charges, which statement is NOT true. A: Positive oxide charges decrease [img=18x22]1802daf62ab2a5d.png[/img]. B: Positive oxide charges decrease [img=18x22]1802daf62ab2a5d.png[/img]. C: Positive oxide charges make C-V curve shift toward negative voltage. D: The C-V curve shift is larger as the charges located near the substrate.
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- Nitrous oxide is commonly known ___________<br/>laughing gas. A: for B: about C: as D: of